NITTA DuPont Incorporated.

Creating state-of-the-art polishing technologies

NITTA DuPont Incorporated was established in 1983 as a joint venture between NITTA Corporation, which had an extensive track record as a leading industrial belt company, and Rodel Inc. (now DuPont), a top manufacturer of polishing pads, which are essential for semiconductor device processes.
Its business objective is to supply ultra-high-precision polishing systems for silicon wafers, which play important roles as key devices in the electronics industry, throughout Japan and all of Asia. From the very start, the company’s destiny has been tied to developing advanced technologies and a global approach.
In an era in which demand truly change by the second, the company has responded to these changing needs accurately and rapidly, accumulated solid expertise, and rose to a trusted position as a high-technology firm that helps support our digital society.
In 1992, the company established an unshakable position by supplying polishing systems that use chemical mechanical polishing (CMP), which in turn has driven dramatic advances in semiconductor device processes. Furthermore, looking to the development of the next generation of technologies, it constructed a Technical Center and Kyoto Plant in Kyotanabe City, Kyoto, in 2005. We will continue to take on the challenges of further refining polishing technologies.