ELIONIX

Since its foundation in 1975, Elionix has always aimed to create equipment that contributes to the advancement of cutting-edge science and technology and has introduced equipment for research and development of nanotechnology to the world.

In the field of electron beam lithography systems, in 1997 we developed an ultra-high-definition electron beam lithography system capable of writing lines 10 nm in width, which is 1/5 of the best specification of those days.

With the two CSs "Challenge and Speed" and "Customer Satisfaction" as our basic stance, we have always developed equipment ahead of our competitors, and we believe this is the reason why we have remained the top runner as a nanotechnology research equipment manufacturer.

Our R&D equipment has been introduced to universities and public institutions in Japan and around the world, and has received high acclaim.

We will continue to be your partner in solving your problems around the world, aiming to be a world brand company that provides the highest-performance equipment and the highest customer satisfaction.